VU Boekhandel

Physical Design and Mask Synthesis for Directed Self-Assembly Lithography

Hoofdkenmerken

Auteur:	Shim, Seongbo; Shin, Youngsoo
Titel:	Physical Design and Mask Synthesis for Directed Self-Assembly Lithography
Uitgever:	Springer International
ISBN:	9783319762937
ISBN boekversie:	9783319762944
Serie:	NanoScience and Technology
Editie:	2018 ed.
Land van oorsprong:	Switzerland
Prijs:	€ 134.09
Verschijningsdatum:	03-04-2018
Bericht:	Langere levertijd (2-3 weken)

Inhoudelijke kenmerken

Categorie:	Semi-conductors & super-conductors
Geillustreerd:	54 Illustrations, color; 38 Illustrations, black and white

Technische kenmerken

Verschijningsvorm:	Hardback
Paginas:	138
Hoogte mm.:	235
Breedte mm.:	155

Inhoud:

This book discusses physical design and mask synthesis of directed self-assembly lithography (DSAL). It covers the basic background of DSAL technology, physical design optimizations such as placement and redundant via insertion, and DSAL mask synthesis as well as its verification.